VON ARDENNE (Germany)

Jw technology Product
VON ARDENNE PROCESS SOLUTIONS

PROVEN COM­PO­NENTS. EX­CEL­LENT RE­SULTS.

What are you look­ing for in a sup­plier of com­po­nents and process so­lu­tions? Ex­pe­ri­ence? Re­li­a­bil­ity? A proven track record?

VON AR­DENNE equip­ment is used in over 50 coun­tries. We have es­tab­lished an in­stalled base of hun­dreds of coat­ing sys­tems world­wide, rang­ing from small tools to equip­ment for large-area coat­ing ap­pli­ca­tions.

Every day, our cus­tomers are fac­ing the chal­lenge of stay­ing in a lead­ing po­si­tion. Why do they choose VON AR­DENNE Process So­lu­tions as their part­ner? For our keys to suc­cess, please con­sult our brochure.

MISSION

Our mis­sion is to cre­ate value by bring­ing our in­dus­try lead­ing tech­nol­ogy and process ex­pe­ri­ence to our cus­tomers. We want to achieve that by of­fer­ing state-of-the-art hard­ware so­lu­tions with best-in-class per­for­mance spec­i­fi­ca­tions and re­li­a­bil­ity.

Fur­ther­more, we of­fer ad­vanced process con­trol hard­ware and soft­ware so­lu­tions to con­trol processes of sin­gle sources or in com­plex layer stacks set­tings. It is our aim to de­liver a guar­an­teed process re­sult ac­cord­ing to your spec­i­fi­ca­tions and time­line. And we are con­fi­dent that we can of­fer you what you are look­ing for in a sup­plier.

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End Blocks

Rotary Magnet Bars

Planar Cathodes

VA Procos Process Control System

Complete Magnetrons

PECVD Sources

Surface Pre-treatment

End blocks

X-Series

  • Cartridge design for all ware parts for easy and fast maintenance
  • Modular end block design with only a few parts to be changed while maintenance and easy adaption of different further process components (e.g. other magnet bars)
  • No deinstallation of end block for maintenance
  • Long time operation and low cost of ownership
  • “O” bearing provides rigid alignment between shaft & seals for bearing life time > 10 years
  • Flexible end block mount for 5x higher target compliance without rotary seal risk
  • Easy to use X-series tool kit

Y-Series

  • Single-sided design
  • Cartridge design for all ware parts for easy and fast maintenance
  • Modular end block design with only a few parts to be changed while maintenance and easy adaption of different further process components (e.g. other magnet bars)
  • No deinstallation of end block for basic maintenance
  • Long time operation and low cost of ownership
  • Easy to use Y-series tool kit
Magnet bars​

RVA30 – RVA50 – RVA70 – RVA100

  • Best in class magnetic field uniformity for optimum layer uniformity
  • Optimized race track return design interchangeable by different end caps for high target utilization, less arcing and particles uniform layer properties over full substrate and uniform sputter rate over target life time
  • Variable sputter angle from ± 15° to ± 60° for better process coupling or reduced process voltage
  • Long time technological experience in all fields of coating applications which flows into magnetic field design
Planar cathodes

WSM – HU-WSM – Planar XT

  • State-of-the-art magnetic field uniformity for optimum layer uniformity
  • Optimized race track return design for high target utilization at target ends, uniform layer properties over full substrate and uniform sputter rate over target life time
  • State of the art magnetic field shape for higher target utilization over full target length
  • Different target mountings (customer’s choice: direct screwed, clamped, hidden clamping, hot clamping)
  • Varying magnetron width to fit customer’s needs in terms of space for installation
  • Long time technological experience in all fields of coating applications which flows into magnetic field design
Process control system

VA PROCOS 2

  • Closed loop control
  • Stabilization of process, reduction of loss, higher sputter rate
  • Automatic on-line balancing
  • Modular set-up
  • Various control features – optical emission, plasma voltage, oxygen partial pressure, generic -10V to +10V
Complete magnetrons

Wide range of DC and AC solutions

  • Long time experience in designing and using of complete magnetron systems for all applications with high technological performance
    – R2R, vertical, horizontal,
    – hot processes,
    – internal or external designs,
    – direct or indirect pumped,
    – with gas manifold or without
    – different anode solutions
  • Equipped with state-of-the-art sputter components
  • Different anode solutions available
  • Can be equipped with different gas inlet solutions (multi-segmented, binary structure)
PECVD Sources

Hollow cathode PECVD Source

  • Simple and scalable design for robust behavior and easy customization
  • High density plasma processing at low costs
  • Low discharge voltage for gentle processing
  • Broad process window

Capacitively Coupled Plasma PECVD Source

  • Scalable high throughput option for all CCP CVD processes
  • Dynamic deposition on various substrates
  • High layer homogeneities
  • Long campaign deposition
  • High durability
  • Maintenance free

Hot WIRE CVD Source

  • Divided source design with separated wire mounting for quick exchange and process restart
  • No plasma process: no ion bombardment, no field accelerated electrons
  • Inherently free of dust
  • Deposition rate up to 10x higher compared with PECVD processes
Surface Pre-Treatment

Linear Ion Source

  • simple and robust design for production environment
  • scalable design for easy fitting
  • highly energetic and strongly focused beam
  • pre-treatment for different substrate materials
  • excellent etching uniformity

VON ARDENNE website

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